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Marker studies of nickel silicide formation

Includes bibliographical references.

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Bibliographic Details
Main Author: McLeod, John Edward
Other Authors: Comrie, Craig M
Format: Thesis
Language:English
Published: Department of Physics 2015
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access_status_str Open Access
author McLeod, John Edward
author2 Comrie, Craig M
author_browse Comrie, Craig M
McLeod, John Edward
author_facet Comrie, Craig M
McLeod, John Edward
author_sort McLeod, John Edward
collection Thesis
description Includes bibliographical references.
format Thesis
id oai:open.uct.ac.za:11427/15903
institution University of Cape Town (South Africa)
language eng
last_indexed 2026-06-10T12:41:59.920Z
license_str Not specified — see source repository
provenance_str_mv Harvested via OAI-PMH from UCTD — University of Cape Town Open Access Repository
publishDate 2015
publishDateRange 2015
publishDateSort 2015
publisher Department of Physics
publisherStr Department of Physics
record_format dspace
source_str UCTD — University of Cape Town Open Access Repository
spelling oai:open.uct.ac.za:11427/15903 Marker studies of nickel silicide formation McLeod, John Edward Comrie, Craig M Pretorius, R Physics Silicides Nickel compounds Tracers (Chemistry) Biochemical markers Includes bibliographical references. Atomic diffusion during the solid state formation of thin films of nickel silicides (Ni2Si and NiSi) from nickel and amorphous silicon has been investigated using 31Si radioactive tracer and inert marker techniques. Samples were prepared by vacuum deposition of thin films of nickel and silicon, followed by thermal annealing to effect silicide growth. The radioactive tracer investigation of Ni2Si showed nickel to be the diffusing species during silicide growth. Sharply defined Ni2si* profiles of 100% radioactive concentration at the sample surface were - obtained. The results are compared with previous results in which the profiles were more spread out and of lower surface concentration. The radioactive tracer investigation of NiSi formation showed that nickel is also the diffusing species during second phase growth. The NiSi * layer was found to be of 100% concentration. Some spreading of the activity profile near the NiSi/NiSi* interface was observed. The results were consistent with previous 31Si tracer work on NiSi formation and also with the present Ni * 2Si results. The inert marker investigation used an ultra-thin (5-10 A) continuous layer of Mo or Ta to monitor atomic movement during silicide growth. The results confirmed nickel to be the diffusing species during the growth of both phases. These results are in excellent agreement with previous inert marker studies of nickel silicide growth. 2015-12-20T15:43:47Z 2015-12-20T15:43:47Z 1988 Master Thesis Masters MSc http://hdl.handle.net/11427/15903 eng application/pdf Department of Physics Faculty of Science University of Cape Town
spellingShingle Physics
Silicides
Nickel compounds
Tracers (Chemistry)
Biochemical markers
McLeod, John Edward
Marker studies of nickel silicide formation
thesis_degree_str Master's
title Marker studies of nickel silicide formation
title_full Marker studies of nickel silicide formation
title_fullStr Marker studies of nickel silicide formation
title_full_unstemmed Marker studies of nickel silicide formation
title_short Marker studies of nickel silicide formation
title_sort marker studies of nickel silicide formation
topic Physics
Silicides
Nickel compounds
Tracers (Chemistry)
Biochemical markers
url http://hdl.handle.net/11427/15903
work_keys_str_mv AT mcleodjohnedward markerstudiesofnickelsilicideformation