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Growth and characterisation of thin film superconductors on oxides, silicon and silicides
Includes bibliographical references.
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| Main Author: | |
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| Other Authors: | |
| Format: | Thesis |
| Language: | English |
| Published: |
Department of Physics
2016
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| _version_ | 1867613188720164865 |
|---|---|
| access_status_str | Open Access |
| author | Naidoo, R Y |
| author2 | Pretorius, R |
| author_browse | Naidoo, R Y Pretorius, R |
| author_facet | Pretorius, R Naidoo, R Y |
| author_sort | Naidoo, R Y |
| collection | Thesis |
| description | Includes bibliographical references. |
| format | Thesis |
| id | oai:open.uct.ac.za:11427/17519 |
| institution | University of Cape Town (South Africa) |
| language | eng |
| last_indexed | 2026-06-10T12:32:11.035Z |
| license_str | Not specified — see source repository |
| provenance_str_mv | Harvested via OAI-PMH from UCTD — University of Cape Town Open Access Repository |
| publishDate | 2016 |
| publishDateRange | 2016 |
| publishDateSort | 2016 |
| publisher | Department of Physics |
| publisherStr | Department of Physics |
| record_format | dspace |
| source_str | UCTD — University of Cape Town Open Access Repository |
| spelling | oai:open.uct.ac.za:11427/17519 Growth and characterisation of thin film superconductors on oxides, silicon and silicides Naidoo, R Y Pretorius, R Comrie, Craig M Physics Includes bibliographical references. High Tc thin film superconductors are of great interest because of their potential applications, particularly in the microelectronics field. A successful superconductor microelectronic technology depends both on the ability to grow good quality superconducting thin films, and the need to incorporate these films into multilayer semiconductor devices. In this work the growth and characterisation of high Tc Y₁Ba₂Cu₃O₇ films by inverted cylindrical magnetron sputtering and pulsed ruby laser ablation on oxides, silicon and silicides is investigated. The inverted cylindrical magnetron sputter system has been effectively used to counter the problem of negative ion re-sputtering found in sputter deposition of oxide films. The optimal growth conditions for both these techniques have been determined. Rutherford backscattering spectrometry is used to obtain thickness and stoichiometry information, while X-ray diffraction gave phase and orientational data. Ion channeling was used for structural analysis and Auger electron spectroscopy was used to determine the homogeneity of the films. 2016-03-04T16:53:53Z 2016-03-04T16:53:53Z 1994 Doctoral Thesis Doctoral PhD http://hdl.handle.net/11427/17519 eng application/pdf Department of Physics Faculty of Science University of Cape Town |
| spellingShingle | Physics Naidoo, R Y Growth and characterisation of thin film superconductors on oxides, silicon and silicides |
| thesis_degree_str | Doctoral |
| title | Growth and characterisation of thin film superconductors on oxides, silicon and silicides |
| title_full | Growth and characterisation of thin film superconductors on oxides, silicon and silicides |
| title_fullStr | Growth and characterisation of thin film superconductors on oxides, silicon and silicides |
| title_full_unstemmed | Growth and characterisation of thin film superconductors on oxides, silicon and silicides |
| title_short | Growth and characterisation of thin film superconductors on oxides, silicon and silicides |
| title_sort | growth and characterisation of thin film superconductors on oxides silicon and silicides |
| topic | Physics |
| url | http://hdl.handle.net/11427/17519 |
| work_keys_str_mv | AT naidoory growthandcharacterisationofthinfilmsuperconductorsonoxidessiliconandsilicides |