Full Text Available
Note: Clicking the button above will open the full text document at the original institutional repository in a new window.
Application of the transformation of 1,2,4-Trimethylbenzene to monitor the chemical vapour deposition of Tetraethoxysilane over ZSM-5
The present work reports an improved chemical vapour deposition (CVD) technique using low temperature, tetraethoxysilane (TEOS) and repeated CVD-calcination cycles. This results in a better control of the external surface activity and the pore mouth size of ZSM-5. In search for effective characteris...
Saved in:
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis |
| Language: | English |
| Published: |
Department of Chemical Engineering
2016
|
| Subjects: | |
| Tags: |
No Tags, Be the first to tag this record!
|
Similar Items: Application of the transformation of 1,2,4-Trimethylbenzene to monitor the chemical vapour deposition of Tetraethoxysilane over ZSM-5
- The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5
- The inertisation of the zeolites ZSM-5, mordenite and beta by chemical vapour deposition using tetraethoxysilane
- Conversion of n-pentenes over H-ZSM-5
- Construction of a chemical vapour deposition reactor and the deposition of ZrC layers
- The effect of oxygenates on the oligomerisation of propene over zeolite ZSM-5
- The impact of process variables on the chemical vapour deposition of silicon carbide