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The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5

Bibliography: leaves 119-124.

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Bibliographic Details
Main Author: Manstein, Heiko
Other Authors: Möller, Klaus
Format: Thesis
Language:English
Published: Department of Chemical Engineering 2014
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access_status_str Open Access
author Manstein, Heiko
author2 Möller, Klaus
author_browse Manstein, Heiko
Möller, Klaus
author_facet Möller, Klaus
Manstein, Heiko
author_sort Manstein, Heiko
collection Thesis
description Bibliography: leaves 119-124.
format Thesis
id oai:open.uct.ac.za:11427/5290
institution University of Cape Town (South Africa)
language eng
last_indexed 2026-06-10T12:31:30.019Z
license_str Not specified — see source repository
provenance_str_mv Harvested via OAI-PMH from UCTD — University of Cape Town Open Access Repository
publishDate 2014
publishDateRange 2014
publishDateSort 2014
publisher Department of Chemical Engineering
publisherStr Department of Chemical Engineering
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source_str UCTD — University of Cape Town Open Access Repository
spelling oai:open.uct.ac.za:11427/5290 The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5 Manstein, Heiko Möller, Klaus O'Connor, Cyril Chemical Engineering Bibliography: leaves 119-124. This thesis reports on the investigation of a cyclic chemical vapour deposition (CVD) method eliminating unwanted surface reactions and enhancing shape selective properties by depositing inert silica onto the external surface of zeolite ZSM-5. A CVD treatment consists out of a deposition, flushing and heating step followed by calcination in flowing air. Modifications are carried out in up to 33 cycles on one and the same sample employing tetraethoxysilane (TEOS) as silica precursor at deposition temperatures ranging from 50 to 400°C. After each CVD treatment the catalyst is tested with appropriate test reactions in order to quantify the extent of modification. The gradual inertisation of the external surface is followed with the catalytic cracking of 1,3,5-triisopropylbenzene (1,3,5-TiPB) which is too bulky to enter the micro-pore structure of ZSM-5. The disproportination of toluene (TDP) is employed to monitor changes of the internal activity and alterations in the shape selective properties of the catalyst. The analysis of reactor effluent during the deposition, flushing and heating step of the modification cycle allows investingating the reaction pathway. The deposition reaction proceeds with the reaction of the alkoxy groups of TEOS with the terminal hydroxyls of the zeolite under the formation of ethanol. 2014-07-31T11:07:25Z 2014-07-31T11:07:25Z 2001 Doctoral Thesis Doctoral PhD http://hdl.handle.net/11427/5290 eng application/pdf Department of Chemical Engineering Faculty of Engineering and the Built Environment University of Cape Town
spellingShingle Chemical Engineering
Manstein, Heiko
The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5
thesis_degree_str Doctoral
title The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5
title_full The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5
title_fullStr The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5
title_full_unstemmed The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5
title_short The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5
title_sort chemical vapour deposition of tetraethoxysilane on zeolite zsm 5
topic Chemical Engineering
url http://hdl.handle.net/11427/5290
work_keys_str_mv AT mansteinheiko thechemicalvapourdepositionoftetraethoxysilaneonzeolitezsm5
AT mansteinheiko chemicalvapourdepositionoftetraethoxysilaneonzeolitezsm5