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The influence of sputtering on ion implantation profiles
Dissertation (MSc (Physics))--University of Pretoria, 2006.
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| Format: | Thesis |
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University of Pretoria
2013
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| _version_ | 1867613503471222784 |
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| access_status_str | Open Access |
| author2 | Hayes, Marianna |
| author_browse | Hayes, Marianna |
| author_facet | Hayes, Marianna |
| collection | Thesis |
| dc_rights_str_mv | © 2000 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria. |
| description | Dissertation (MSc (Physics))--University of Pretoria, 2006. |
| format | Thesis |
| id | oai:repository.up.ac.za:2263/23559 |
| institution | University of Pretoria (South Africa) |
| last_indexed | 2026-06-10T12:37:11.117Z |
| license_str | Other — see source repository |
| provenance_str_mv | Harvested via OAI-PMH from UPSpace — University of Pretoria Institutional Repository |
| publishDate | 2013 |
| publishDateRange | 2013 |
| publishDateSort | 2013 |
| publisher | University of Pretoria |
| publisherStr | University of Pretoria |
| record_format | dspace |
| source_str | UPSpace — University of Pretoria Institutional Repository |
| spelling | oai:repository.up.ac.za:2263/23559 The influence of sputtering on ion implantation profiles Hayes, Marianna upetd@up.ac.za Hayes, Marianna Thugwane, Samuel Jaye Ion implatantion profiles Sputtering (physics) UCTD Dissertation (MSc (Physics))--University of Pretoria, 2006. The accurate knowledge of the implantation profiles is of considerable interest for testing theoretical models on the stopping of ions in matter, as well as for many important applications in metallurgy and semiconductor technology. Measurements of the depth distribution profiles of the implanted ions provide information on a wide range of fields, including ion-solid interactions, doping and diffusion. Several experimental methods have been employed to determine the depth distributions of the implanted ions. They can be divided into destructive and non-destructive methods. Most experimental results found in the literature are for heavier ions implanted into lighter target materials where the non¬destructive Rutherford Back-scattering method can be employed. Nuclear Reaction Analysis also provides a non-destructive method for determining the implanted profile of impurity atoms with mass number smaller or similar to that of the target material. One of the important effects in ion implantation is sputtering, the process in which the surface of the target material is eroded due to ion bombardment. This process modifies range moments of implantation profiles for high fluences. This study is mainly concerned about effects of sputtering on the implanted depth profile as a function of fluence and target mass. Sputtering correction factors are determined numerically to correct the theoretical depth distributions. Physics unrestricted 2013-09-06T15:35:13Z 2006-04-07 2013-09-06T15:35:13Z 2001-04-01 2006-04-07 2006-03-29 Dissertation Thugwane, SJ 2000, The influence of sputtering on ion implantation profiles, MSc dissertation, University of Pretoria, Pretoria, viewed yymmdd < http://hdl.handle.net/2263/23559 > H1203/ag http://hdl.handle.net/2263/23559 http://upetd.up.ac.za/thesis/available/etd-03292006-121735/ © 2000 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria. application/pdf University of Pretoria |
| spellingShingle | Ion implatantion profiles Sputtering (physics) UCTD The influence of sputtering on ion implantation profiles |
| title | The influence of sputtering on ion implantation profiles |
| title_full | The influence of sputtering on ion implantation profiles |
| title_fullStr | The influence of sputtering on ion implantation profiles |
| title_full_unstemmed | The influence of sputtering on ion implantation profiles |
| title_short | The influence of sputtering on ion implantation profiles |
| title_sort | influence of sputtering on ion implantation profiles |
| topic | Ion implatantion profiles Sputtering (physics) UCTD |
| url | http://hdl.handle.net/2263/23559 http://upetd.up.ac.za/thesis/available/etd-03292006-121735/ |