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Investigation of the diffusion behaviour of aliminium in different semiconductors

Thesis (PhD (Physics))--University of Pretoria, 2006.

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Other Authors: Friedland, Erich Karl Helmuth
Format: Thesis
Published: University of Pretoria 2013
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access_status_str Open Access
author2 Friedland, Erich Karl Helmuth
author_browse Friedland, Erich Karl Helmuth
author_facet Friedland, Erich Karl Helmuth
collection Thesis
dc_rights_str_mv © 1999 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria.
description Thesis (PhD (Physics))--University of Pretoria, 2006.
format Thesis
id oai:repository.up.ac.za:2263/30090
institution University of Pretoria (South Africa)
last_indexed 2026-06-10T12:38:53.005Z
license_str Other — see source repository
provenance_str_mv Harvested via OAI-PMH from UPSpace — University of Pretoria Institutional Repository
publishDate 2013
publishDateRange 2013
publishDateSort 2013
publisher University of Pretoria
publisherStr University of Pretoria
record_format dspace
source_str UPSpace — University of Pretoria Institutional Repository
spelling oai:repository.up.ac.za:2263/30090 Investigation of the diffusion behaviour of aliminium in different semiconductors Friedland, Erich Karl Helmuth upetd@up.ac.za Hauser, Thilo Michael Electronic circuits Aluminum Semiconductors diffusion UCTD Thesis (PhD (Physics))--University of Pretoria, 2006. Please read the abstract in the section 00front of this document Physics unrestricted 2013-09-07T17:55:14Z 2006-12-04 2013-09-07T17:55:14Z 1999-12-01 2006-12-04 2006-12-04 Thesis Hauser TM, 1999, Investigation of the diffusion behaviour of aluminium in different semiconductors, PhD thesis, University of Pretoria, Pretoria, viewed yymmdd < http://hdl.handle.net/2263/30090 > H573/th http://hdl.handle.net/2263/30090 http://upetd.up.ac.za/thesis/available/etd-12042006-134717/ © 1999 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria. application/pdf application/pdf application/pdf application/pdf application/pdf application/pdf application/pdf application/pdf University of Pretoria
spellingShingle Electronic circuits
Aluminum
Semiconductors diffusion
UCTD
Investigation of the diffusion behaviour of aliminium in different semiconductors
title Investigation of the diffusion behaviour of aliminium in different semiconductors
title_full Investigation of the diffusion behaviour of aliminium in different semiconductors
title_fullStr Investigation of the diffusion behaviour of aliminium in different semiconductors
title_full_unstemmed Investigation of the diffusion behaviour of aliminium in different semiconductors
title_short Investigation of the diffusion behaviour of aliminium in different semiconductors
title_sort investigation of the diffusion behaviour of aliminium in different semiconductors
topic Electronic circuits
Aluminum
Semiconductors diffusion
UCTD
url http://hdl.handle.net/2263/30090
http://upetd.up.ac.za/thesis/available/etd-12042006-134717/