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The migration behaviour of xenon implanted into glassy carbon

Thesis (PhD (Physics))--University of Pretoria, 2019.

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Other Authors: Malherbe, Johan B.
Format: Thesis
Language:English
Published: University of Pretoria 2020
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access_status_str Open Access
author2 Malherbe, Johan B.
author_browse Malherbe, Johan B.
author_facet Malherbe, Johan B.
collection Thesis
dc_rights_str_mv © 2019 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria.
description Thesis (PhD (Physics))--University of Pretoria, 2019.
format Thesis
id oai:repository.up.ac.za:2263/75311
institution University of Pretoria (South Africa)
language English
last_indexed 2026-06-10T12:36:48.172Z
license_str Other — see source repository
provenance_str_mv Harvested via OAI-PMH from UPSpace — University of Pretoria Institutional Repository
publishDate 2020
publishDateRange 2020
publishDateSort 2020
publisher University of Pretoria
publisherStr University of Pretoria
record_format dspace
source_str UPSpace — University of Pretoria Institutional Repository
spelling oai:repository.up.ac.za:2263/75311 The migration behaviour of xenon implanted into glassy carbon Malherbe, Johan B. mmahjoub2010@gmail.com Njoroge, E.G. (Eric G.) Hlatshwayo, Thulani Thokozani Ismail, Mahjoub Yagoub Abdalla UCTD Thesis (PhD (Physics))--University of Pretoria, 2019. This study is in two parts. Both parts are geared towards the study of the effectiveness of glassy carbon as a good storage material was investigated. Firstly, 200 keV Xe ions were implanted into glassy carbon substrates to a fluence of 1×1016 ions/cm2 at room temperature. Also, we have also investigated the effect of SHI irradiation on Xe as-implanted samples at a fluence of 1×1014 ions/cm2. After implantation and swift heavy ion irradiation, the samples were investigated using several techniques. This was with a view to characterizing the level of damage created by the ion bombardment, the distributions of the Xe ions in glassy carbon and the effect of SHI irradiation on these distributions. The irradiated and un-irradiated but implanted with Xe samples were isochronally annealed in a vacuum in steps of 100 C for 5 hours at temperatures ranging from 300 C – 800 C and 900 C – 1500 C, respectively. Physics PhD (Physics) Unrestricted 2020-07-16T12:45:52Z 2020-07-16T12:45:52Z 2014-03-20 2019 Thesis Ismail, MYA 2019, The migration behaviour of xenon implanted into glassy carbon, PhD (Physics) Thesis, University of Pretoria, Pretoria, viewed yymmdd <http://hdl.handle.net/2263/75311> http://hdl.handle.net/2263/75311 en © 2019 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria. application/pdf University of Pretoria
spellingShingle UCTD
The migration behaviour of xenon implanted into glassy carbon
title The migration behaviour of xenon implanted into glassy carbon
title_full The migration behaviour of xenon implanted into glassy carbon
title_fullStr The migration behaviour of xenon implanted into glassy carbon
title_full_unstemmed The migration behaviour of xenon implanted into glassy carbon
title_short The migration behaviour of xenon implanted into glassy carbon
title_sort migration behaviour of xenon implanted into glassy carbon
topic UCTD
url http://hdl.handle.net/2263/75311