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Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures

Thesis (PhD (Physics))--University of Pretoria, 2019.

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Other Authors: Malherbe, Johan B.
Format: Thesis
Language:English
Published: University of Pretoria 2020
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access_status_str Open Access
author2 Malherbe, Johan B.
author_browse Malherbe, Johan B.
author_facet Malherbe, Johan B.
collection Thesis
dc_rights_str_mv © 2019 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria.
description Thesis (PhD (Physics))--University of Pretoria, 2019.
format Thesis
id oai:repository.up.ac.za:2263/75389
institution University of Pretoria (South Africa)
language English
last_indexed 2026-06-10T12:36:49.885Z
license_str Other — see source repository
provenance_str_mv Harvested via OAI-PMH from UPSpace — University of Pretoria Institutional Repository
publishDate 2020
publishDateRange 2020
publishDateSort 2020
publisher University of Pretoria
publisherStr University of Pretoria
record_format dspace
source_str UPSpace — University of Pretoria Institutional Repository
spelling oai:repository.up.ac.za:2263/75389 Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures Malherbe, Johan B. alawad20024@gmail.com Crouse, Philippus L. Bissett, Hertzog Hlatshwayo, Thulani Thokozani Njoroge, E.G. (Eric G.) Alawad, Bilal Abbas Bilal UCTD Nuclear material science ZrC chemical vapor deposition Thesis (PhD (Physics))--University of Pretoria, 2019. In this thesis,zirconium carbide (ZrC) layers were deposited on graphite substrates using a CVD reactor at temperatures ranging from 1250 °C to 1450 °C in steps of 50 °C. The deposited layers were characterised by XRD, Raman Spectroscopy and SEM.ZrCsamples were also prepared by spark plasma sintering (SPS), at 1700, 1900 and 2100 °C at 50 MPa for 10 minutes. The phase and microstructure after the sintering process were investigated by XRD and SEM. Iridium (Ir) thin films were deposited on these ZrCsamples and annealed in vacuum at temperatures of 600 and 800 °C for 2h. The phase composition, solid-state reactions and surface morphology were investigated by GIXRD and SEM. XRD was used to identify the phases present in the as-deposited and annealed samples. It showed that Ir2Zr was the initial phase formed at 600 °C. At temperature 800 °C IrZr formed. University of Pretoria Physics PhD (Physics) Unrestricted 2020-07-22T11:02:18Z 2020-07-22T11:02:18Z 2020-09 2019 Thesis Alawad, BAB 2019, Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures, PhD (Physics) Thesis, University of Pretoria, Pretoria, viewed yymmdd <http://hdl.handle.net/2263/75389> A2020 http://hdl.handle.net/2263/75389 en © 2019 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria. application/pdf University of Pretoria
spellingShingle UCTD
Nuclear material science
ZrC
chemical vapor deposition
Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures
title Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures
title_full Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures
title_fullStr Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures
title_full_unstemmed Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures
title_short Zirconium carbide (ZrC) synthesised via chemical vapour deposition (CVD) and spark plasma sintering (SPS) and phase formation of iridium (Ir) films deposited on ZrC at relatively low temperatures
title_sort zirconium carbide zrc synthesised via chemical vapour deposition cvd and spark plasma sintering sps and phase formation of iridium ir films deposited on zrc at relatively low temperatures
topic UCTD
Nuclear material science
ZrC
chemical vapor deposition
url http://hdl.handle.net/2263/75389