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Charge carrier effects in free standing Si membranes investigated by linear and second harmonic optical techniques

Thesis (PhD)--Stellenbosch University, 2016

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Main Author: Ndebeka, Wilfrid Innocent
Other Authors: Rohwer, Erich G.
Format: Thesis
Language:en_ZA
Published: Stellenbosch : Stellenbosch University 2016
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access_status_str Open Access
author Ndebeka, Wilfrid Innocent
author2 Rohwer, Erich G.
author_browse Ndebeka, Wilfrid Innocent
Rohwer, Erich G.
author_facet Rohwer, Erich G.
Ndebeka, Wilfrid Innocent
author_sort Ndebeka, Wilfrid Innocent
collection Thesis
dc_rights_str_mv Stellenbosch University
description Thesis (PhD)--Stellenbosch University, 2016
format Thesis
id oai:scholar.sun.ac.za:10019.1/100120
institution Stellenbosch University (South Africa)
language en_ZA
last_indexed 2026-06-10T12:44:41.678Z
license_str Other — see source repository
provenance_str_mv Harvested via OAI-PMH from SUNScholar — Stellenbosch University Repository
publishDate 2016
publishDateRange 2016
publishDateSort 2016
publisher Stellenbosch : Stellenbosch University
publisherStr Stellenbosch : Stellenbosch University
record_format dspace
source_str SUNScholar — Stellenbosch University Repository
spelling oai:scholar.sun.ac.za:10019.1/100120 Charge carrier effects in free standing Si membranes investigated by linear and second harmonic optical techniques Ndebeka, Wilfrid Innocent Rohwer, Erich G. Neethling, Pieter N. Steenkamp, Christine M. Stafast, Herbert Stellenbosch University. Faculty of Science. Dept. of Physics Second harmonic generation (SHG) Electric field induced second harmonic (EFISH) Free carrier absorption (FCA) Silicon (Si) Silicon dioxide Silicon membranes Metal oxide semiconductors UCTD Thesis (PhD)--Stellenbosch University, 2016 ENGLISH ABSTRACT : Silicon (Si) based materials have been of technological importance throughout the years and today silicon remains a leading material in microelectronics industries. The silicon/silicon dioxide (Si/SiO2) interface has been one of the most studied systems in the realms of material and condensed matter physics. Despite the great outpouring research and huge technological success, there has been little effort to construct a comprehensive, unified microphysical model of the Si/SiO2 interface. The optical properties, both linear and nonlinear, of the interface region are of interest since they vary considerably from those of the adjacent bulk phases. Second harmonic generation is used as a versatile tool to investigate surfaces and buried interfaces of centrosymmetric materials such as Si. Specifically, the electric field induced second harmonic (EFISH) generation process is used as a valuable technique to investigate the mechanisms of charge transfer and trap generation and population, both by electrons and holes being pumped across the interface. In this work, the transmission of the fundamental laser beam (90 fs pulse trains at 80MHz repetition rate, 800 nm) through 10 m to 30 m thick silicon (Si) membranes as well as simultaneous measurements of the electric field induced second harmonic (EFISH) generated in reflection from and transmission through the Si membranes are reported for the first time. The transmission of the laser power through Si membranes, irradiated at an incident angle of 45 , shows an increase with increased power, then reaches a maximum, and finally continues to decrease considerably as the incident power is increased. A similar behavior is observed with the EFISH signals in transmission of the Si membranes. The nonlinear behavior of the fundamental transmitted signal is attributed to free charge carrier absorption (FCA) in Si. The experimental setup and these results are discussed in this thesis. AFRIKAANSE OPSOMMING : Silikon (Si) gebaseerde materiale is reeds vir jar van tegnologiese belang en vandag Si steeds ’n prominente materiaal in die mikroëlektronika nywerheid. Die silikon/silikondioksied (Si/SiO2) skeidingsvlak is een van die mees bestudeerde stelsels in die navorsingsveld van materiaal- en vastetoestand- Fisika. Ten spyte van die omvangryke navorsing en groot tegnolgiese sukses , is daar nog min werk gedoen om’n omvattende, verenigde fisiese model op die mikroskopiese skaal van die Si/SiO2 skeidingsvlak te ontwikkel. Die optiese eienskappe , sowel lineêre en nie-lineêre , van die skeidingsvlak-gebied is van belang aangesien die oorgansgebied se eienskappe beduidend verskil van dié van aangrensende uniforme fases. Tweede harmoniek generering word gebruik as ’n veelsydige tegniek om oppervlaktes en interne skeidingsvlakke van sentrosimmetriese materiale soos Si te ondersoek. Die elektriese veld geïnduseerde tweede harmoniek (EFISH) genereringsproses word spesifiek gebruik as ’n veelsydige tegniek om die meganismes van ladingsoordrag, ladingsval-generering en die bevolking van ladingsvalle te ondersoek-, deur beide elektrone en holtes oor die skeidingsvlak te pomp. In hierdie werk word vir die eerste keer verslag gedoen van meting van die transmissie van die fundamentele laserbundel (90 fs pulse teen ’n herhalingstempo van 80 MHz, 800 nm) deur 10 mikrometer tot 30 mikrometer dik silikon (Si) membrane, sowel as gelyktydige meting van die electriese veld geïnduseerde tweede harmoniek (EFISH) wat gegenereer word in refleksie van en transmissie deur die Si membrane. Die deurgelate fundamentele laserdrywing deur Si membrane, teen 45 grade invalshoek, too ’n toename met verhoogde drywing van die invallende lig, dan ’n maksimum, en verminder daarna aansienlik met verdere toename in drywing van die invallende lig. Die nie-lineêre gedrag van die fundamentele sein in transmissie word toegeskryf aan vrye ladingsdraer-absorpsie (FCA) in Si. Die eksperimentele opstelling en hierdie resultate sal in hierdie proefskrif bespreek word. Doctoral 2016-12-22T13:17:32Z 2016-12-22T13:17:32Z 2016-12 Thesis http://hdl.handle.net/10019.1/100120 en_ZA Stellenbosch University xiv, 101 pages : illustrations (some colour) application/pdf Stellenbosch : Stellenbosch University
spellingShingle Second harmonic generation (SHG)
Electric field induced second harmonic (EFISH)
Free carrier absorption (FCA)
Silicon (Si)
Silicon dioxide
Silicon membranes
Metal oxide semiconductors
UCTD
Ndebeka, Wilfrid Innocent
Charge carrier effects in free standing Si membranes investigated by linear and second harmonic optical techniques
title Charge carrier effects in free standing Si membranes investigated by linear and second harmonic optical techniques
title_full Charge carrier effects in free standing Si membranes investigated by linear and second harmonic optical techniques
title_fullStr Charge carrier effects in free standing Si membranes investigated by linear and second harmonic optical techniques
title_full_unstemmed Charge carrier effects in free standing Si membranes investigated by linear and second harmonic optical techniques
title_short Charge carrier effects in free standing Si membranes investigated by linear and second harmonic optical techniques
title_sort charge carrier effects in free standing si membranes investigated by linear and second harmonic optical techniques
topic Second harmonic generation (SHG)
Electric field induced second harmonic (EFISH)
Free carrier absorption (FCA)
Silicon (Si)
Silicon dioxide
Silicon membranes
Metal oxide semiconductors
UCTD
url http://hdl.handle.net/10019.1/100120
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