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The development of equipment for the fabrication of thin film superconductor and nano structures
Thesis (MScEng (Electrical and Electronic Engineering))--University of Stellenbosch, 2011.
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| Format: | Thesis |
| Language: | en_ZA |
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Stellenbosch : University of Stellenbosch
2011
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| _version_ | 1867613948141895681 |
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| access_status_str | Open Access |
| author | Buttner, Ulrich |
| author2 | Perold, W. J. |
| author_browse | Buttner, Ulrich Perold, W. J. |
| author_facet | Perold, W. J. Buttner, Ulrich |
| author_sort | Buttner, Ulrich |
| collection | Thesis |
| dc_rights_str_mv | University of Stellenbosch |
| description | Thesis (MScEng (Electrical and Electronic Engineering))--University of Stellenbosch, 2011. |
| format | Thesis |
| id | oai:scholar.sun.ac.za:10019.1/6595 |
| institution | Stellenbosch University (South Africa) |
| language | en_ZA |
| last_indexed | 2026-06-10T12:44:15.221Z |
| license_str | Other — see source repository |
| provenance_str_mv | Harvested via OAI-PMH from SUNScholar — Stellenbosch University Repository |
| publishDate | 2011 |
| publishDateRange | 2011 |
| publishDateSort | 2011 |
| publisher | Stellenbosch : University of Stellenbosch |
| publisherStr | Stellenbosch : University of Stellenbosch |
| record_format | dspace |
| source_str | SUNScholar — Stellenbosch University Repository |
| spelling | oai:scholar.sun.ac.za:10019.1/6595 The development of equipment for the fabrication of thin film superconductor and nano structures Buttner, Ulrich Perold, W. J. University of Stellenbosch. Faculty of Engineering. Dept. of Electrical and Electronic Engineering. Thin film fabrication Sputtering Superconductors Dissertations -- Electronic engineering Theses -- Electronic engineering Nanotechnology Dry etching Thesis (MScEng (Electrical and Electronic Engineering))--University of Stellenbosch, 2011. ENGLISH ABSTRACT: The nano-age is more about the mesoscopic phenomena, than those occurring at molecular and atomic level, which have been studied by chemists and physicists for more than a hundred years. Nanotechnology is currently one of the most active fields being explored in many different disciplines by many scientists across the world. In this research field, it is imperative to continually create more effective and superior methods to build smaller and smaller electronic devices, circuits and sensors. Technology is being improved continually and, specifcally at our university, there was a need to improve our device manufacturing facility. The aim of this work was to create a new sputtering system, build a dry etching system and to make modifications to upgrade existing equipment. This work has been done to produce nano structures or devices and, most importantly, to save costs. New systems and equipment have been built to keep up with the progress in this field. In order to understand the significance of the different types of equipment used in the fabrication of thin film superconductor layers, an overview will be given of the complete process of manufacturing a patterned Josephson junction. The apparatus used will be described and critically analyzed, whereby the shortfalls in design will be highlighted and improvements shown. Some of the equipment, such as the plasma laser deposition system, the lithography system and the test facility existed before and has been modified. Newly designed systems were built to further improve the quality of our thin film superconductors; these include the inverted cylindrical magnetron (ICM) sputtering system, the argon ion mill and the incandescent substrate heater. Finally, the results of the improved thin films and structures will be shown. To summarize: The entire process was analyzed and upgraded, resulting in an improved device manufacturing facility. AFRIKAANSE OPSOMMING: Die nano-era het aangebreek en nanotegnologie is tans een van die mees aktiewe en diverse navorsingsvelde wat wetenskaplikes wêreldwyd ontgin - hoofsaaklik as gevolg van nuwe verskynsels op molekulêre en atomiese vlak. In die nanotegnologie-navorsingsveld is die vereiste dat daar voortdurend meer effektiewe metodes gevind moet word om die al hoe meer miniatuurwordende elektroniese meganismes met verbeterde energieverbruik, spoed en ruimtebesparende vermoëns tot stand te bring. Dit is duidelik dat in hierdie toonaangewende navorsingsveld, waar tegnologiese ontwikkeling voorturend en snelgroeiend is, dit dikwels vinniger is om reeds bestaande toerusting aan te pas en te moderniseer ten einde in pas te bly met nuutontwikkelde en ontwikkelende tegnologieë. Die doel van die werk verrig, wat hier beskryf word, was om 'n nuwe deponeerstelsel, sowel as 'n droogets stelsel te bou. Bestaande apparaat is opgradeer deur verandering aan te bring. Die uiteintelikke doel is die vervaarding van beter nano-strukture, en terselfde tyd om kostes te bespaar. Nuwe stelsels en toerusting is gebou om tred te hou met tegnologiese vooruitgang. Om die belangrikheid van die verskillende tipes toerusting wat in die vervaardiging van dunlaag- supergeleierlae gebruik word te verstaan, sal 'n oorsig van die volledige vervaardigingsproses van 'n Josephson-patroon gegee word. Die apparaat wat gebruik is, sal beskryf en krities ontleed word en die tekorte in ontwerp sal uitgelig word, terwyl verbeterings aangetoon sal word. Sommige van die toerusting het voorheen bestaan en is aangepas, byvoorbeeld die plasmalaser-neerleggingstelsel, die litografiestelsel en die toetsfasiliteit. Nuwe ontwerpstelsels is gebou om die gehalte van ons dunlaagsupergeleiers verder te verbeter. Dit sluit die silindriese plasma deponeer stelsel, die Argon-ioon bron en die substraatverwarmer in. In hierdie tesis word daar eerstens 'n oorsig gegee van die totstandkomingsproses van 'n supergeleier kwantum-interfensiemeganisme, beginnende met dunlaagneerslag van YBCO (Yttrium, Barium en Koperoksied). Die oorsig word gevolg deur 'n stap-virstap beskrywing van elke daaropvolgende proses wat lei tot die voltooiing van die meganisme. Daarna word die toetsprosedure van die dunlaag en instrumente verduidelik. Bykomende veranderinge wat aan bestaande instrumente aangebring is (ten einde die dunfilmlae te verbeter en die toetsfasiliteit op te gradeer) word ook bespreek. Daar sal ook verwys word na artikels wat in verskeie joernale verskyn het oor die vernuwende aanpassings en sisteme wat in hierdie tesis verduidelik word. Ten slotte sal die resultate van die verbeterde dunlae en strukture getoon word. Kortom: die hele proses is ontleed en opgegradeer om 'n verbeterde apparaatvervaardigingsfasiliteit tot gevolg te hê. 2011-02-22T12:31:17Z 2011-03-14T08:22:41Z 2011-02-22T12:31:17Z 2011-03-14T08:22:41Z 2011-03 Thesis http://hdl.handle.net/10019.1/6595 en_ZA University of Stellenbosch 104 p. : ill. application/pdf Stellenbosch : University of Stellenbosch |
| spellingShingle | Thin film fabrication Sputtering Superconductors Dissertations -- Electronic engineering Theses -- Electronic engineering Nanotechnology Dry etching Buttner, Ulrich The development of equipment for the fabrication of thin film superconductor and nano structures |
| title | The development of equipment for the fabrication of thin film superconductor and nano structures |
| title_full | The development of equipment for the fabrication of thin film superconductor and nano structures |
| title_fullStr | The development of equipment for the fabrication of thin film superconductor and nano structures |
| title_full_unstemmed | The development of equipment for the fabrication of thin film superconductor and nano structures |
| title_short | The development of equipment for the fabrication of thin film superconductor and nano structures |
| title_sort | development of equipment for the fabrication of thin film superconductor and nano structures |
| topic | Thin film fabrication Sputtering Superconductors Dissertations -- Electronic engineering Theses -- Electronic engineering Nanotechnology Dry etching |
| url | http://hdl.handle.net/10019.1/6595 |
| work_keys_str_mv | AT buttnerulrich thedevelopmentofequipmentforthefabricationofthinfilmsuperconductorandnanostructures AT buttnerulrich developmentofequipmentforthefabricationofthinfilmsuperconductorandnanostructures |