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Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment

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Bibliographic Details
Published in:IEEE Journal of the Electron Devices Society
Format: Online Article RSS Article
Published: 2026
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container_title IEEE Journal of the Electron Devices Society
description
discipline_display Technology & Engineering
discipline_facet Technology & Engineering
format Online Article
RSS Article
genre Journal Article
id rss_article:31156
institution FRELIP
journal_source_facet IEEE Journal of the Electron Devices Society
publishDate 2026
publishDateSort 2026
record_format rss_article
spellingShingle Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment
Electronics
Technology & Engineering — Aerospace & Applied Tech
Technology & Engineering
sub_discipline_display Technology & Engineering — Aerospace & Applied Tech
sub_discipline_facet Technology & Engineering — Aerospace & Applied Tech
subject_display Electronics
Technology & Engineering — Aerospace & Applied Tech
Technology & Engineering
Electronics
Technology & Engineering — Aerospace & Applied Tech
Technology & Engineering
subject_facet Electronics
Technology & Engineering — Aerospace & Applied Tech
Technology & Engineering
title Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment
title_auth Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment
title_full Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment
title_fullStr Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment
title_full_unstemmed Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment
title_short Overcoming the Mobility–Stability Trade-Off Using an Ultra-Thin Oxide Capping Layer via N2O Plasma Treatment
title_sort overcoming the mobility–stability trade-off using an ultra-thin oxide capping layer via n2o plasma treatment
topic Electronics
Technology & Engineering — Aerospace & Applied Tech
Technology & Engineering
url http://ieeexplore.ieee.org/document/11448788