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Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System
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| Published in: | IEEE Journal of the Electron Devices Society |
|---|---|
| Format: | Online Article RSS Article |
| Published: |
2026
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| Subjects: | |
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| _version_ | 1868553327168454656 |
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| collection | WordPress RSS FRELIP Feed Integration |
| container_title | IEEE Journal of the Electron Devices Society |
| description | |
| discipline_display | Electronics |
| discipline_facet | Electronics |
| format | Online Article RSS Article |
| genre | Journal Article |
| id | rss_article:74189 |
| institution | FRELIP |
| journal_source_facet | IEEE Journal of the Electron Devices Society |
| last_indexed | 2026-06-20T21:35:10.452Z |
| publishDate | 2026 |
| publishDateSort | 2026 |
| record_format | rss_article |
| spellingShingle | Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System Electronics General Electronics |
| sub_discipline_display | General |
| sub_discipline_facet | General |
| subject_display | Electronics General Electronics |
| subject_facet | Electronics General Electronics |
| title | Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System |
| title_alt | Realización de diodos puros de boro/Si mediante un crecimiento de dos pasos a baja temperatura en un sistema LP CVD construido en casa Réalisation de diodes pures bore/silicium par une croissance en deux étapes à basse température dans un système LP CVD maison Realização de diodos puros de boro/Si através de um crescimento de baixa temperatura em duas etapas em um sistema LP CVD construído em casa |
| title_auth | Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System |
| title_es_txt | Realización de diodos puros de boro/Si mediante un crecimiento de dos pasos a baja temperatura en un sistema LP CVD construido en casa |
| title_fr_txt | Réalisation de diodes pures bore/silicium par une croissance en deux étapes à basse température dans un système LP CVD maison |
| title_full | Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System |
| title_fullStr | Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System |
| title_full_unstemmed | Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System |
| title_pt_txt | Realização de diodos puros de boro/Si através de um crescimento de baixa temperatura em duas etapas em um sistema LP CVD construído em casa |
| title_short | Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System |
| title_sort | realization of pure boron/si diodes through a two-step low-temperature growth in a home-built lp cvd system |
| topic | Electronics General Electronics |
| url | http://ieeexplore.ieee.org/document/11408807 |