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Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and Laplace-DLTS

Thesis (PhD)--University of Pretoria, 2010.

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Other Authors: Auret, F.D. (Francois Danie)
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Published: University of Pretoria 2013
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access_status_str Open Access
author2 Auret, F.D. (Francois Danie)
author_browse Auret, F.D. (Francois Danie)
author_facet Auret, F.D. (Francois Danie)
collection Thesis
dc_rights_str_mv © 2009 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria.
description Thesis (PhD)--University of Pretoria, 2010.
format Thesis
id oai:repository.up.ac.za:2263/26574
institution University of Pretoria (South Africa)
last_indexed 2026-06-10T12:36:41.285Z
license_str Other — see source repository
provenance_str_mv Harvested via OAI-PMH from UPSpace — University of Pretoria Institutional Repository
publishDate 2013
publishDateRange 2013
publishDateSort 2013
publisher University of Pretoria
publisherStr University of Pretoria
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source_str UPSpace — University of Pretoria Institutional Repository
spelling oai:repository.up.ac.za:2263/26574 Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and Laplace-DLTS Auret, F.D. (Francois Danie) cloud.nyamhere@up.ac.za Meyer, W.E. (Walter Ernst) Nyamhere, Cloud Dlts Defects Radiation Silicon Germanium Ldlts UCTD Thesis (PhD)--University of Pretoria, 2010. Defects in semiconductors are crucial to device operation, as they can either be beneficial or detrimental to the device operation depending on the application. For efficient devices it is important to characterize the defects in semiconductors so that those defects that are bad are eliminated and those that are useful can be controllably introduced. In this thesis, deep level transient spectroscopy (DLTS) and high-resolution Laplace-DLTS (LDLTS) have been used to characterize deep level defects introduced by energetic particles (electrons or Ar ions) and during metallization using electron beam deposition on silicon and germanium. Schottky diodes were used to form the space-charge region required in DLTS and LDLTS measurements. From the DLTS and LDLTS measurements the activation enthalpy required to ionize a trap, ET, and defect carrier capture cross-section ó were deduced. LDLTS proved particularly useful since it could separate deep levels with closely spaced energy levels (the limit being defects with emission rates separated by a factor greater than 2), which was not possible by conventional DLTS. The majority carrier traps in gallium-, boron- and phosphorus-doped silicon introduced after MeV electron irradiation and during electron beam deposition have been characterized, and several defects such as the divacancy, A-center and E-center and other complex defects were observed after the two processes. Annealing studies have shown that all deep levels are removed in silicon after annealing between 500°C-600°C. Both electron and hole traps introduced in n-type germanium by electron irradiation, Ar sputtering and after electron beam deposition have been characterized using DLTS and LDLTS. The E-center is the most common defect introduced in germanium after MeV electron irradiation and during electron beam deposition. Annealing shows that defects in germanium were removed by low thermal budget of between 350°C - 400°C and it has been deduced that the E-center (V-Sb) in germanium anneals by diffusion. The identification of some of the defects was achieved by using defect properties such as defect signature, introduction rates, annealing behavior and annealing mechanisms, and then comparing these properties to theoretical defect models and results from other techniques. Physics unrestricted 2013-09-07T06:38:12Z 2010-05-26 2013-09-07T06:38:12Z 2010-04-16 2010-05-26 2010-02-02 Thesis Nyamhere, C 2009, Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and laplace-DLTS, PhD thesis, University of Pretoria, Pretoria, viewed yymmdd < http://hdl.handle.net/2263/26574 > B10/130/ag http://hdl.handle.net/2263/26574 http://upetd.up.ac.za/thesis/available/etd-02022010-134937/ © 2009 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria. application/pdf application/pdf application/pdf application/pdf application/pdf application/pdf application/pdf University of Pretoria
spellingShingle Dlts
Defects
Radiation
Silicon
Germanium
Ldlts
UCTD
Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and Laplace-DLTS
title Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and Laplace-DLTS
title_full Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and Laplace-DLTS
title_fullStr Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and Laplace-DLTS
title_full_unstemmed Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and Laplace-DLTS
title_short Characterization of process and radiation induced defects in Si and Ge using conventional deep level transient spectroscopy (DLTS) and Laplace-DLTS
title_sort characterization of process and radiation induced defects in si and ge using conventional deep level transient spectroscopy dlts and laplace dlts
topic Dlts
Defects
Radiation
Silicon
Germanium
Ldlts
UCTD
url http://hdl.handle.net/2263/26574
http://upetd.up.ac.za/thesis/available/etd-02022010-134937/